advantages of interferometer
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Interferometric approaches each haveadvantages. Different techniques use monochromatic, multiwavelength, and white-light sources combined with optics such as microscopes to examine surfaces to high precision. Interferometry is a versatile measurement technology for examining surface topography with very high precision
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Surface metrology is one of the main applications of interferometry. Microscope-based white-light profilers are capable of mapping up to a 10-mm-wide area in a single measurement with subnanometer resolution, providing instantaneous information about surface roughness, shape, and waviness. When larger areas need to be measured, a stitching procedure can be used in which a number of partially overlapping measurements are combined into one surface profile. The lateral resolution of an interferometer is defined by the optical system and the wavelength; this resolution can be as good as 300 nm. Several interferometric measurement modes can be used, each of which has its particular strengths, though there is some overlap among their capabilities.
Vertical scanning interferometry is used to characterize surfaces with higher roughness and/or discontinuities, such as steps, cavities, islands, and so on. Heights up to several millimeters can be resolved, though measurement time is longer (several seconds to a minute) due to the added vertical scan length. The technique is accurate down to single nanometers, making the method well-suited for applications in microelectromechanical systems (MEMS) and semiconductor measurements. Several important process parameters can be easily measured using VSI. When combined with high-numerical-aperture (NA) lenses such as a 100X Linnik objective (NA of 0.95), it can be particularly attractive for characterizing such interferometrys as wall angles or vias. The same capability can be used for integrated optical circuits, waveguides, thick films, precision machined surfaces, and numerous other industrial measurements.
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Vertical scanning interferometry is used to characterize surfaces with higher roughness and/or discontinuities, such as steps, cavities, islands, and so on. Heights up to several millimeters can be resolved, though measurement time is longer (several seconds to a minute) due to the added vertical scan length. The technique is accurate down to single nanometers, making the method well-suited for applications in microelectromechanical systems (MEMS) and semiconductor measurements. Several important process parameters can be easily measured using VSI. When combined with high-numerical-aperture (NA) lenses such as a 100X Linnik objective (NA of 0.95), it can be particularly attractive for characterizing such interferometrys as wall angles or vias. The same capability can be used for integrated optical circuits, waveguides, thick films, precision machined surfaces, and numerous other industrial measurements.
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djbabu:
nice answer
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