Question

Atomic layer deposition of tantalum nitride using tantalum ethoxide

Answer 1

Answer:

Atomic Layer Deposition -

Forge Nano Atomic layer deposition (ALD) is a vapor phase technique used to deposit thin films onto a substrate. The process of ALD involves the surface of a substrate being exposed to alternating precursors, which do not overlap but instead are introduced sequentially.

Answer 2

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It is a technique used to deposit thin flims on substrate.