Question

Briefly explain the various process involved in fabrication monolithic IC which integrates diodes.
capacitance and FET.​

Answer 1

Answer:

The N-type silicon material is grown as a single crystal extension of the P-layer and the components are required are fabricated using series of P-type and N-type impurity diffusions. The N-type layer becomes the collector for the transistor or an element for a diode or a capacitor.