Question

Difference between diffusion and ion implantation technique .

Answer 1

The terms ion implantation and diffusion are related to semiconductors. These are two processes involved in the production of semiconductors.

Ion implantation is a fundamental process used to make microchips. It is a low-temperature process that includes the acceleration of ions of a particular element towards a target, altering the chemical and physical properties of the target.

Diffusion can be defined as the motion of impurities inside a substance. It is the main technique used to introduce impurities into semiconductors.

The main difference between ion implantation and diffusion is that:-

ion implantation is isotropic and very directional whereas diffusion is isotropic and involves lateral diffusion.

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