Difference between laser ablation and laser deposition
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Laser ablation is the process of removing material from a solid surface by irradiating it with a laser beam. At low laser flux, the material is heated by the absorbed laser energy and evaporates or sublimates.
Pulsed laser deposition is a technique where a pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited.
This material is ablated from the target, forms a plasma plume, and subsequently deposits as a thin film on a substrate.
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Laser ablation is the process of removing material from a solid surface by irradiating it with a laser beam. At low laser flux, the material is heated by the absorbed laser energy and evaporates or sublimates.
Pulsed laser deposition is a technique where a pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited.
This material is ablated from the target, forms a plasma plume, and subsequently deposits as a thin film on a substrate.
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Explanation:
Laser ablation is the process of removing material from a solid surface by irradiating it with a laser beam. At low laser flux, the material is heated by the absorbed laser energy and evaporates or sublimates.
Pulsed laser deposition is a technique where a pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited.
This material is ablated from the target, forms a plasma plume, and subsequently deposits as a thin film on a substrate.
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