difference between photolithography and electron beam lithography and ion beam lithography
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Lithography:
Lithography is the key technology to realize very small feature size for nano components.
Photolitholgraphy:
Photolithography is the selective process that allows the patterning of a desired design onto the material we want to fabricate with (the wafer in the semiconductor industry).
Electron Beam (e-beam) Lithography:
Today, Electron-Beam Lithography (EBL) is employed to make the smallest components on silicon substrates and is the most effective method of creating patterns on substrates such as photo masks and x-ray masks.
Lithography is the key technology to realize very small feature size for nano components.
Photolitholgraphy:
Photolithography is the selective process that allows the patterning of a desired design onto the material we want to fabricate with (the wafer in the semiconductor industry).
Electron Beam (e-beam) Lithography:
Today, Electron-Beam Lithography (EBL) is employed to make the smallest components on silicon substrates and is the most effective method of creating patterns on substrates such as photo masks and x-ray masks.
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