Question

difference between photolithography and electron beam lithography and ion beam lithography

Answer 1

Lithography:
Lithography is the key technology to realize very small feature size for nano components. 

Photolitholgraphy:
Photolithography is the selective process that allows the patterning of a desired design onto the material we want to fabricate with (the wafer in the semiconductor industry). 

Electron Beam (e-beam) Lithography:
Today, Electron-Beam Lithography (EBL) is employed to make the smallest components on silicon substrates and is the most effective method of creating patterns on substrates such as photo masks and x-ray masks.