Doping of silicon with p or al increases the conductivity. The differences in the two cases is
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Doping with phosphorus increases the conductivity by providing a extra electron as its valency is 5 and that of silicon is 4 and it is known as n-type semiconductor. On the other hand doping with Aluminum has 3 valency so it creates a hole and electron can move into this.
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The difference between doping silicon with phosphorus and doping silicon with aluminum are listed below:
Doping with Phosphorus:
- Four valence electrons make up silicon. When phosphorus (which has five valence electrons) is used to replace a silicon atom, each of the four silicon atoms on either side of it can share one electron.
- The phosphorus valence electron's fifth electron is now free to move.
- As a result, adding phosphorus atoms to silicon causes it to become more conductive.
Doping with Aluminum:
- A P-type material is created when pure silicon is combined with trivalent aluminum.
- Due to the fact that this particular type of dopant material only has three valence electrons, it is eagerly seeking a fourth electron.
- A hole is used to represent this one electron shortage.
- Due to the electrons' ability to jump into the next, the conductivity is increased by the presence of holes.
For more information on Doping with trivalent or pentavalent elements, refer to these answers:
https://brainly.in/question/11588985
https://brainly.in/question/12917222
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