Question

Electron beam lithography patterns are exposed with electrons. the small wavelength of electrons helps to achieve small feature sizes (in order of nm). assume an electron gun of energy 50 kev. what is the wavelength of these electrons? assume the mass of electron = 9.109 × 10−31 kg and planck’s constant, h = 6.626 × 10−34 j.s. neglect the relativistic effect. a) 5.5 nm b) 0.0039 nm
c) 3.9 nm d) 0.0055 nm

Answer 1

Answer:

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Answer 2

Answer:

0.0055nm will be the wavelength