Question

h2so4 is an oxidising gent whereas h3po4 is not why

Answer 1

Acetic Acid (99.8 %)

Thinner, wetting agent and chemical buffer in various etching solutionssuch as Al-etchants.

Sales volumes: 2,5 L bottles (1 PU = 6 x 2,5 liters)

For further information please refer to the product page:

> Acetic Acid

Hydrofluoric Acid (1%, 10%, and 50%)

Used for etching of SiO2 and (together with HNO3) for etching of silicon.

Sales volumes: 2,5 L bottles (1 PU = 6 x 2,5 liters)

For further information please refer to the product page:

> Hydrofluoric Acid

Phosphoric Acid (H3PO4 - 85%)  

This acid is an ingredient to many etching solutions, such as solutions for etching of Al (Aluminum), GaAs (gallium arsenide), InP (indium phosphide), Ag (silver) or ZnO (zinc oxide). Very hot concentrated phosphoric acid can also be used for etching of SiNx (silicon nitride).

Sales volumes: 2,5 L bottles (1 PU = 6 x 2,5 liters)

For further information please refer to the product page:

> Phosphoric Acid

Buffered Oxide Etch (BOE 7:1)

(Ammoniumfluoride Etching Solution 87.5:12.5 or Buffered Hydrofluoric Acid)

Used for etching of SiO2. Due to the higher PH value in contrast to unbuffered HF it gives better results in combination with photo resists.

The etch rate on SiO2 is (depending on temperature and SiO2 morphology) in the range of 70-90 nm per minute.

Also available Buffered Oxide Etch, BOE 7:1 with Surfactant.

Sales volumes: 2,5 L bottles (1 PU = 6 x 2,5 liters)

For further information please refer to the product page:

> BOE

Nitric Acid (69.5 %)

Ingredient of the silicon etchant, and etching solutions for Ga-containingIII/V-semiconductors.

Sales volumes: 2,5 L bottles (1 PU = 6 x 2,5 liters)

For further information please refer to the product page:

> Nitric Acid

Hydrochloric Acid (37 %)

Ingredient of aqua regia and etching mixtures for various III/V-semiconductors such as InP.

Sales volumes: 2,5 L bottles (1 PU = 6 x 2,5 liters)

For further information please refer to the product page:

> Hydrochloric Acid

Sulphuric Acid (96 %)

Ingredient of the piranha-etch as well as etching solutions for Ga-containing

III/V-semiconductors

Sales volumes: 2,5 L bottles (1 PU = 6 x 2,5 liters)