Question

In a photolithography process, the gap between wafer and photomask is 0.01 mm, the thickness of photoresist is 0.5 µm and the incoming light wavelength is 436 nm. determine the resolution

Answer 1

Resolution = $\bold{1.22\frac{\lambda D}{d}}$
Here, λ is the wavelength , D is the distance between water photomask , d is the thickness of photoresist

Here, d = 0.5 μm = 0.5 × 10⁻⁶m
D = 0.01mm = 1 × 10⁻⁵ m
λ = 436 nm = 436 × 10⁻⁹m

So, resolution = 1.22 × 10⁻⁵× 436 × 10⁻⁹/0.5 × 10⁻⁶ = 2.44 × 436 × 10⁻⁸ m
= 1063.84 × 10⁻⁸m = 1.06384 × 10⁻⁵ m