Question

In electron beam lithography patterns are exposed with electrons. The small wavelength of electrons helps to achieve small feature sizes (in order of nm). Assume an electron gun of energy 100 keV. What is the wavelength of these electrons? Assume the mass of electron =9.109×10−31 kg and Planck's constant, h=6.626×10−34 J.s. Neglect the relativistic effect. 1.5 nm 0.0039 nm 3.9 nm 0.015 nm

Answer 1

"The relation between energy and wavelength is given by

E = hc / wavelength

Since E is in eV, we have to convert it into Joules.

E = 1.6 * 10-14 J

1.6 * 10-14= 6.626 * 10-34 * 3 * 108 / wavelength

Wavelength = 1.24 * 10-11 m

Hence, the above equation proves the relation between energy and wavelength.

"

Answer 2

In electron beam lithography patterns are exposed with electrons. The small wavelength of electrons helps to achieve small feature sizes (in order of nm). Assume an electron gun of energy 100 keV. What is the wavelength of these electrons? Assume the mass of electron =9.109×10−31 kg and Planck's constant, h=6.626×10−34 J.s. Neglect the relativistic effect. 1.5 nm 0.0039 nm 3.9 nm 0.015 nm

10-1.1.....@nswer.!