Preparation of polytetrafluoroethylene
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manufacturer of PTFE begin by synthesizing the TFE the three ingredients of TFE fluorspar hydrofluoric acid and chloroform are combined in a chemical reaction chamber heated to between (590-900°C) the resultant gas colded and distilled to remove any impurities....
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Polytetrafluoroethylene has been prepared by pulsed electron deposition technique on glass and silicon substrates. Deposition of the thin films has been carried out in the temperature range from room temperature to 300°C, pressure range from 133.32×10-3 Pa to 799.93×10^-3 Pa, and discharge voltages between 10 kV and 16 kV. Argon or nitrogen has been used as a background gas during the deposition of the films.
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