Question

Question No. 1 The process in which chloroalkane react with elemental silicon at 200-300 OC in the presence of copper to yield chlorosilane is known as Answer A. Dewar process B. Rochow process C с Craig process Mitchell process D​

Answer 1

Answer:

(a) Silicon is heated with methyl chloride at high temperature in the presence of copper catalyst at 537 K, methyl substituted chlorosilanes MeSiCl

3

,Me

2

SiCl

2

,Me

3

SiCl and Me

4

Si are formed.

(b) When silicon dioxide is treated with hydrogen fluoride, first SiF

4

is formed and then hydro fluorosilicic acid is obtained.

SiO

2

+4HF→SiF

4

+2H

2

O

SiF

4

+2HF→H

2

SiF

6

(c) When CO is heated with ZnO, ZnO is reduced to Zn metal.

CO+ZnO

Δ

CO

2

+Zn

(d) When hydrated alumina is treated with aqueous NaOH solution, it dissolves to form sodium meta aluminate.

Al

2

O

3

.2H

2

O+2NaOH→2NaAlO

2

+3H

2

O