Vapour phase method
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Vapour phase decomposition (VPD) is a method used in the semiconductor industry to improve the sensitivity of total-reflection x-ray fluorescence spectroscopy by changing the contaminant from a thin layer (which has an angle-dependent fluorescence intensity in the TXRF-domain) to a granular residue.
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Vapour phase decomposition (VPD) is a method used in the semiconductor industry to improve the sensitivity of total-reflection x-ray fluorescence spectroscopy by changing the contaminant from a thin layer (which has an angle-dependent fluorescence intensity in the TXRF-domain) to a granular residue.
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