What are the types of equipment for atomic layer deposition?
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Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas phase chemical process; it is a subclass of chemical vapour deposition. Through the repeated exposure to separate precursors, a thin film is slowly deposited.
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Atomic layer deposition (ALD) is a thin-filmdeposition technique based on the sequential use of a gas phase chemical process; it is a subclass of chemical vapour deposition
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