Question

What is sputtering ? how argon influences the process ?
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Answer 1

Explanation:

Generally, the gas flow rates have an effect on the thin film growth, grain size, crystal orientation and chemical state. The crystal orientation you can be checked by the XRD.

I recommend reading this paper showing the effect of the influence of argon gas flow on the microstructure, surface morphological behaviour, and the mechanical and electrical properties of sputtered titanium nitride thin films.

Higher flow rate leads to higher pressure.

Higher pressure leads to less energy of the particles deposited at the substrate.

Less particle energy gives less denser films: at very high sputtering pressure the structure is more like evaporated films .

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