Which method is used in ic fabrication for deposition of dielectric materials (e.g.: sio2, si3n4, sic) ?
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your answer is
chemical vapour deposition is used
aknashaveeya:
Sputtering is also used
Answered by
1
here is ur answer
chemical vapour deposition is used
hope it helps you
chemical vapour deposition is used
hope it helps you
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