Question

Which one of the following is the most common form of radiation used in photolithography?

Answer 1

The PhableR 100 tool provides unprecedented ability to print high resolution periodic structures in a low-cost photolithography system. It is similar to a conventional mask-aligner where a photoresist coated wafer is put in proximity to a mask and exposed by a beam of UV light, but thanks to the break-through PHABLE exposure technology of Eulitha the resolution is no longer limited by diffraction. In the 'PHABLE' mode, sub-micron linear gratings and 2D patterns such as hexagonal and square lattices are printed with high uniformity and quality. In the 'mask aligner' mode, micron scale features can be printed easily.

Answer 2

Ultraviolet radiation is the most common form of radiation which is used in photolithography.

Due to the most common use of ultraviolet radiation photolithography is also commonly called as UV lithography.

Photolithography is a process used in microfabrication to pattern parts of a thin film or the bulk of a substrate.

It is used because it can create extremely small patterns, it affords exact control over the shape and size of the pattern it creates, and because it can create patterns over an entire surface cost effectively.

Earlier, lamp based lithography tools were used but due to the need of industries for higher resolution and throughput they are no longer used.

In the present Times, the excimer laser lithography machines are used for the process of photolithography.