Question

Which oxidation process is used to grow silicon dioxide on silicon wafer?

Answer 1

In microfabrication, thermal oxidation is a way to produce a thin layer of oxide (usually silicon dioxide) on the surface of a wafer. The technique forces an oxidizing agent to diffuse into the wafer at high temperature and react with it. The rate of oxide growth is often predicted by the Deal-Grove model.[1] Thermal oxidation may be applied to different materials, but this article will only consider oxidation of silicon substrates to produce silicon dioxide

Answer 2

In microfabrication, thermal oxidation is a way to produce a thin layer of oxide (usually silicon dioxide) on the surface of a wafer. The technique forces an oxidizing agent to diffuse into the wafer at high temperature and react with it. The rate of oxide growth is often predicted by the Deal-Grove model.[1] Thermal oxidation may be applied to different materials, but this article will only consider oxidation of silicon substrates to produce silicon dioxide

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