advantages of ion implantation over diffusion
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hi friend....
Main advantages of ion implantation compared todiffusion for the doping of semiconductors are: Short process times, good homogeneity and reproducibility of the profiles. ... Low penetration depth of theimplanted ions. This allows modification of thin areas near the surface with high concentration gradients.
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Main advantages of ion implantation compared todiffusion for the doping of semiconductors are: Short process times, good homogeneity and reproducibility of the profiles. ... Low penetration depth of theimplanted ions. This allows modification of thin areas near the surface with high concentration gradients.
hope you like it
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