Question

Deposition process is the most widely used process for the deposition of thin films such as silicon nitride, silicon dioxide and polysilicon

Answer 1

Thin Film Deposition is the technology of applying a very thin film of material – between a few nanometers to about 100 micrometers, or the thickness of a few atoms – onto a “substrate” surface to be coated, or onto a previously deposited coating to form layers.