What happens if mean free path is larger than distance between source and substrate
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This is the relation between vapor pressure of the evaporant and the evaporation rate. If a high vacuum is established, most molecules/atoms will reach the substrate • High film deposition rates;
• Less substrate surface damage from impinging atoms as the film is
being formed, unlike sputtering that induces more damage because it
involves high-energy particles;
• Excellent purity of the film because of the high vacuum condition used
by evaporation;
• Less tendency for unintentional substrate heating.without intervening collisions.
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