What is the difference in semiconductors obtained by doping of silicon with aluminium?
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Doping is the process of adding impurities to intrinsic semiconductors to alter their properties. Normally Trivalent and Pentavalent elements are used to dope Silicon and Germanium. When an intrinsic semiconductor is doped with Trivalent impurity it becomes a P-Type semiconductor.
Boron has atomic number 5. It has 3 electrons in its outer orbit, i.e. 3 valence electrons. Elements with 3 valence electrons are used for p-type doping and 5-valence electrons for n-type doping. Hence when Boron is doped with Silicon, it creates p-type doping.
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