What three parameters can be improved to achieve better optical resolution in lithography?
Answers
Answered by
0
The performance of a lithographic exposure is determined by three parameters:
resolution, registration, and throughput. Resolution is defined to be the minimum
feature dimension that can be transferred with high fidelity to a resist film on a
semiconductor wafer. Registration is a measure of how accurately patterns on
successive masks can be aligned or overlaid with respect to previously defined
patterns on the same wafer. Throughput is the number of wafers that can be
exposed per hour for a given mask level and is thus a measure of the efficiency of
the lithographic process
Similar questions