which synthetic method is used for producing a thin film material
Answers
Chemical solution deposition (CSD) or chemical bath deposition (CBD) uses a liquid precursor, usually a solution of organometallic powders dissolved in an organic solvent. This is a relatively inexpensive, simple thin-film process that produces stoichiometrically accurate crystalline phases.
Answer: This may help you
Explanation:
Chemical vapor deposition (CVD):
This process is mostly used in semiconductor industry for depositing thin films of various materials. This is mainly chemical process. In this process
the substrate is exposed one or more volatile precursors. These precursors decompose on the substrate and produce the desired deposit . In CVD, the vaporized precursors are introduced into a CVD reactor and adsorb onto a substance held at an elevated temperature.