Question

Why do oxide layer is used in the cmos fabrication at every stage?

Answer 1

Oxidation layering — this optional step deposits a thin layer of SiO2 over the complete wafer by exposing it to a mixture of high-purity oxygen and hydrogen at ± 1000°C. The oxide is used as an insulation layer and also forms transistor gates.

Answer 2

oxidation layering the optional step deposits a thin layer of Sio2 over the complete water by exposing it to a mixture of high-purity oxygen and hydtogen unto 1000°C. the oxidation is used in insulation layers and also forms transister gates